As design nodes drop below 45nm, design rules are exploding in number and complexity, making design rule checking (DRC) harder and lengthier. What we have observed across the industry is that the ...

Pattern matching (PM) was first introduced as the semiconductor industry began to shift from simple one-dimensional rule checks to the two-dimensional checks required by sub-resolution lithography.

Pattern matching is best known for its use in detecting lithographic hotspots, but it’s also widely used across all physical verification flows, and has expanded into design-for-manufacturing (DFM) ...

How often have you struggled to verify static random-access memory (SRAM) blocks in your design? And how often, no matter how much time you spend on them, do they end up causing manufacturing issues?

Experienced Java developers are committed to continuous improvement. We always seek ways to make our code more readable, reliable and efficient. Java's evolution provides a steady stream of powerful ...

This file type includes high resolution graphics and schematics. IC physical verification (i.e., design rule checking or “DRC”) used to be easy. In the good old days, you could run some ...

Take advantage of pattern matching improvements in C# 8.0 to write code that is more readable, maintainable, and efficient Pattern matching is an excellent feature that was introduced in C# 7. You can ...

Learn how to use pattern-matching features in your Java programs, including pattern matching with switch statements, when clauses, sealed classes, and a preview of primitive type pattern matching in ...