China’s EUV effort reached 13.5 nm light generation, with chips not yet produced, helping you gauge AI supply risk and timing.

Moore's Law is not advancing as fast as it used to be under 2nm and even into the Angstrom level, and competitors are trying to catch up. Can ASML, the Dutch semiconductor equipment maker, continue ...

How Does EUV Lithography Work? EUV Lithography is a state-of-the-art technology in chip manufacturing that uses highly energetic ultraviolet light to carve detailed patterns onto semiconductor ...

In this artist's rendition, mirrors focus extreme ultraviolet light to pattern a latent image in a polymer thin film infiltrated by indium-containing gaseous molecules. For more than 50 years, the ...

According to a report from Tom's Hardware, China's so-called "Frankenstein" EUV scanner was assembled from mismatched parts sourced through various channels, potentially including surplus equipment ...

Making high-NA EUV lithography work will take a manufacturing-worthy approach to stitching together circuits or a wholesale change to larger masks. Circuit stitching between the exposure fields is ...

A team of boffins lead by Professor Tsumoru Shintake of the Okinawa Institute of Science and Technology (OIST) has unveiled a groundbreaking and significantly simplified EUV lithography tool, poised ...

Professor Tsumoru Shintake of the Okinawa Institute of Science and Technology (OIST) has proposed an extreme ultraviolet (EUV) lithography technology that he claims is superior to the method currently ...

Imec is a world-leading research and innovation center in nanoelectronics and digital technologies. Imec has more than 6.000 employees and top researchers, for R&D in advanced semiconductor and system ...

As the semiconductor dream has become a national security issue, I would not underestimate China's ambition,' Natixis analyst ...

Steven Scheer: "The opening of the joint ASML-imec High NA EUV Lithography Lab in Veldhoven, the Netherlands, marked a milestone in preparing High NA EUV for adoption in mass manufacturing [1].

The move to curvilinear shapes on photomasks is gaining steam after years of promise as a way of improving yield, lowering defectivity, and reducing wasted space on a die — all of which are essential ...